NEW ULTRATHIN SEMICONDUCTORS CAN MAKE MORE EFFICIENT AND TEN TIMES SMALLER TRANSISTORS THAN SILICON
The researchers at Stanford University have discovered two ultrathin semiconductors – hafnium diselenide and zirconium diselenide. They share or even exceed some of the very important characteristics of silicon. Silicon has a great property of forming “rust” or silicon dioxide (SiO2) by reacting with oxygen. As the SiO2 acts as an insulator, chip manufacturers implement this property to isolate their circuits on […]